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Diamond Growth by Systems
Mono
|
Poly Crystalline
Evaporation
Systems
Sputtering
Systems
ION Milling
Systems
Diamond Growth
Systems
Special Application &
Production Systems
Qubit Multi
Technique Systems
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Integrated Systems
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Diamond Growth by Systems
Mono & Poly Crystalline
SSDR 150 - Microwave plasma-assisted CVD (MW-PACVD) reactor
Dedicated to Diamond Film and Gem Synthesis
High power density plasma for high purity diamond films & high growth rate
Optimized microwave & plasma design. Reliable and robust equipment
Perfectly adjusted to the needs of both R&D labs and industry
Easy to clean and change bell jar configuration
Highly suitable for doped diamond films.
High power density plasma
High operating pressure up to 400 mbar or more
6 kW micro-wave generator (SMPS)
4 gas Lines (additional lines on request)
2” Ф substrate holder
Automatic height adjustment of the substrate carrier during growth (optional)
Substrate spinning during growth (optional)
Easy substrate loading / unloading
Bi-chromatic IR pyrometer (475 – 1475 ° C)
Turbo molecular pump + dry primary pump
Basic reactor pressure: 2×10-7 mbar
Fully automated process & very low maintenance
Application
Mono-Crystalline Diamonds
Poly-Crystalline Diamonds
Jewellery Grade Diamonds
Industrial Diamonds
Lab Grade Gems
Related Products
Evaporation System HV/ UHV - Thermal & e-Beam
Sputtering System HV/ UHV - RF/ DC/ Multi-tech
ION Milling System
RIBE/ CAIBE
Special Application & Production Systems
Qubit Multi Technique/ Chamber Cluster Systems
Glove Box Integrated
Systems
Intuitive & Interactive Automation Control