ION Milling System
RIBE/ CAIBE
- ICP sources – 14 or 20 cm beam size
- Current density up to 4 mA/cm2
- Energy Range from 100 to 1000 eV
- Automatic pumping unit (Turbo / Cryo)
- Tiltable substrate holder with planetary rotation and water cooling
- Manual or Automatic Load-Lock
- Etch finish detectors (LASER Interferometer / SIMS)
Application
- M-RAM
- Transitional metal treatment
- MEMS & NEMS
