Evaporation System HV/ UHV
Thermal & e-Beam
- Box shape chamber with front door, cylindrical chamber with top
lid
- Load-lock with substrate treatment (plasma, ion gun, heating,
oxidation)
- Up to 8″ standard single or multiple substrates
- Resistive (Joule effect), electron beam or inductive sources
- Various sample holder functions: heating, water cooling, rotation
and/or tilt, LN2
Application
- Lift-off processes
- HMET, PHMET transistors
- Ohmic and Schottky contacts on GaN
- IR waveguides
- Thermal barriers
- Magnetic materials for microwave applications
- MEMS encapsulation
- Josephson junctions and related circuits
